Nanolithography at 350 KV in a TEM
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4), 187-190
- https://doi.org/10.1016/0167-9317(89)90044-0
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Resolution limits for electron-beam lithographyIBM Journal of Research and Development, 1988
- Very high voltage (500 kV) electron beam lithography for thick resists and high resolutionJournal of Vacuum Science & Technology B, 1987
- Resolution Limits of PMMA Resist for Exposure with 50 kV ElectronsJournal of the Electrochemical Society, 1981
- Electron-beam fabrication of 80-Å metal structuresApplied Physics Letters, 1976