Instrumentation for conformable photomask lithography

1 July 1975

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices

Vol. 22 (7), 496-498
https://doi.org/10.1109/t-ed.1975.18168

Abstract

A vacuum frame and a multiple mask alignment system for conformable photomask lithography are described. These instruments greatly improve the convenience and adaptability of conformable photomask lithography and may permit the advantages of improved resolution, dimensional control, photoresist profile control, and reduced mask damage to be realized in routine photolithographic production.

Keywords

ALIGNMENT
ADAPTABILITY
CONVENIENCE
ROUTINE
PHOTOMASK LITHOGRAPHY
CONFORMABLE PHOTOMASK

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