High-field transient behaviour of thin RF sputtered Al-Al2O3-Al films
- 21 August 1975
- journal article
- Published by IOP Publishing in Journal of Physics C: Solid State Physics
- Vol. 8 (16), L351-L356
- https://doi.org/10.1088/0022-3719/8/16/003
Abstract
Charging and discharging current transients have been measured as a function of voltage and film thickness on thin sputtered films of Al2O3 in Al-Al2O3-Al junctions. These currents decay with time as I varies as exp(-t/ tau ) for short times and t-n1 for longer times, followed by a t-n2 dependence. The relaxation time tau primarily increases with voltage and saturates for higher voltages. The coefficient n1 tends to increase with decreasing voltage, while n2 increases with voltage. Current theories of I-t response based on space charge and polarization effects do not generally predict the two-stage t-n dependence. Their physical bases are outlined, and possible modifications to them are briefly discussed.Keywords
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