UV-laser photodeposition from surface-adsorbed mixtures of trimethylaluminum and titanium tetrachloride

Abstract

The kinetics of surface photochemistry in adsorbed mixtures of titanium tetrachloride (TiCl4) and trimethylaluminum [Al2(CH3)6] is studied by UV-laser-induced photodeposition. Although both TiCl4 and Al2(CH3)6 individually undergo adsorbed-phase photoreactions, a new photoreaction channel is observed when they are simultaneously present. Pressure dependencies of the reaction rate indicate that the new channel is a two-component photoreaction in the adsorbed mixture. The data can be qualitatively understood in terms of a Langmuir–Hinshelwood mechanism in conjunction with competitive adsorption of the two components.