Strain-Induced Energy Shift of Photoluminescence Spectra in MOCVD-Grown ZnTe Films on (100) GaAs Substrates
- 1 August 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (8A), L1341-1344
- https://doi.org/10.1143/jjap.28.l1341
Abstract
It has been revealed that heteroepitaxial ZnTe films grown on (100) GaAs substrates by low-pressure metalorganic chemical vapour deposition (MOCVD) receive considerably biaxial tensile stress. In order to characterize the effect of strains on the optical properties, the dependence of the 2.32 eV donor-acceptor pair and oxygen-bound-exciton emissions on film thickness was investigated in the range of 1 to 8 µm. It was found that photoluminescence (PL) peaks shift toward the lower-energy side and that full-width at half-maximum (FWHM) values of both PL and X-ray diffraction peaks decrease with increasing film thickness, suggesting that the film quality significantly depends upon its thickness.Keywords
This publication has 8 references indexed in Scilit:
- Intrinsic and extrinsic photoluminescence spectra of ZnTe films on GaAs deposited by molecular-beam and organo-metallic vapor-phase epitaxyJournal of Applied Physics, 1988
- Transmission electron microscopy of (001) ZnTe on (001) GaAs grown by molecular-beam epitaxyJournal of Applied Physics, 1988
- Fabrication and photoluminescence properties of ZnTe and CdZnTe films by low pressure metalorganic chemical-vapour depositionJournal of Crystal Growth, 1988
- OMVPE growth of CdTe-ZnTe superlatticesJournal of Crystal Growth, 1988
- Molecular beam epitaxial growth of a novel strained layer type III superlattice system: HgTe-ZnTeApplied Physics Letters, 1986
- Effects influencing the structural integrity of semiconductors and their alloysJournal of Vacuum Science & Technology A, 1985
- The nature of the predominant acceptors in high quality zinc tellurideJournal of Luminescence, 1978
- Surface charge and stress in the Si/SiO2 systemSolid-State Electronics, 1973