Generation of clean surfaces in high vacuum
- 1 September 1963
- journal article
- Published by IOP Publishing in British Journal of Applied Physics
- Vol. 14 (9), 537-543
- https://doi.org/10.1088/0508-3443/14/9/301
Abstract
No abstract availableKeywords
This publication has 75 references indexed in Scilit:
- METALS CONTACTS ON CLEAVED SILICON SURFACESAnnals of the New York Academy of Sciences, 1963
- Sputtering of Dielectrics by High-Frequency FieldsJournal of Applied Physics, 1962
- Reactions of Oxygen with Pure Tungsten and Tungsten Containing CarbonJournal of Applied Physics, 1961
- p Layers on Vacuum Heated SiliconJournal of Applied Physics, 1960
- Cleaning of Silicon Surfaces by Heating in High VacuumJournal of Applied Physics, 1959
- Work function and emission studies on clean silicon surfacesJournal of Physics and Chemistry of Solids, 1959
- Field Emission Microscope and Flash Filament Techniques for the Study of Structure and Adsorption on Metal SurfacesThe Journal of Physical Chemistry, 1953
- Surface Phenemona Useful in Vacuum TechniqueIndustrial & Engineering Chemistry, 1948
- A New Technique for Preparing Monocrystalline Metal Surfaces for Work Function Study. The Work Function of Ag(100)Physical Review B, 1941
- Catalytic activity, crystal structure and adsorptive properties of evaporated metal filmsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1940