Abstract
The defect microstructure induced in single-crystal aluminum oxide by bombardment with high-energy ions has been studied by transmission electron microscopy (TEM). The effects of the irradiation temperature, the type of ion used for irradiation, and the presence of inert gas atoms upon the microstructure were examined in detail. The intrinsic, displacement-induced defect structures which resulted from ion bombardment appeared quite similar to the microstructures of aluminum oxide subjected to fast neutron or high energy electron irradiation at similar temperatures and doses. The most significant changes in the microstructure were caused by bombardment with helium ions. Implantation of helium into alumina at low temperature followed by annealing at high temperature resulted in the formation of a dense dislocation network. The large number of defects required to account for this network may have arisen from strong trapping of helium by radiation-induced vacancies, which left a large population of interstitials to collect into loops.