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On structure and properties of sputtered Ti and Al based hard compound films
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On structure and properties of sputtered Ti and Al based hard compound films
On structure and properties of sputtered Ti and Al based hard compound films
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O. Knotek
O. Knotek
MB
M. Böhmer
M. Böhmer
TL
T. Leyendecker
T. Leyendecker
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1 November 1986
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 4
(6)
,
2695-2700
https://doi.org/10.1116/1.573708
Abstract
No abstract available
Keywords
LATTICE PARAMETER
NITROGEN
MAGNETRON SPUTTERING
FACE CENTERED CUBIC
CRYSTAL STRUCTURE
TITANIUM
Cited by 355 articles