Microphotonics devices based on silicon microfabrication technology
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- 22 February 2005
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Selected Topics in Quantum Electronics
- Vol. 11 (1), 232-240
- https://doi.org/10.1109/jstqe.2004.841479
Abstract
This work presents our recent progress in the development of an Si wire waveguiding system for microphotonics devices. The Si wire waveguide promises size reduction and high-density integration of optical circuits due to its strong light confinement. However, large connection and propagation losses had been serious problems. We solved these problems by using a spot-size converter and improving the microfabrication technology. As a result, propagation losses as low as 2.8 dB/cm for a 400/spl times/200 nm waveguide and a coupling loss of 0.5 dB per connection were obtained. As we have the technologies for the fabrication of complex, practical optical devices using Si wire waveguides, we used them to make microphotonics devices, such as a ring resonator and lattice filter. The devices we made exhibit excellent characteristics because of the microfabrication with the precision of a few nanometers. We have also demonstrated that Si wire waveguides have great potential for use in nonlinear optical devices.Keywords
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