Physical characterization of halogenated and hydrogenated amorphous silicon films
- 1 July 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 69 (3), 315-320
- https://doi.org/10.1016/0040-6090(80)90582-9
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- R.f. plasma deposition of amorphous silicon films from SiCl4-H2Thin Solid Films, 1980
- Effect of annealing on the optical properties of plasma deposited amorphous hydrogenated siliconSolar Energy Materials, 1979
- Localized States in Amorphous and Polycrystallized SiJapanese Journal of Applied Physics, 1978
- Optical and photoconductive properties of discharge-produced amorphous siliconJournal of Applied Physics, 1977