Reflow and burial of channel waveguides formed in sol-gel glass on Si substrates
- 1 September 1993
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Technology Letters
- Vol. 5 (9), 1077-1079
- https://doi.org/10.1109/68.257197
Abstract
A reflow step and an improved burial procedure are demonstrated for channel waveguides formed in sol-gel glass on silicon substrates. Thick sol-gel films are deposited by repetitive spin coating and rapid thermal annealing, and etched to form ridge waveguides. Furnace heating is then used to melt both core and buffer layers simultaneously, providing a smooth surface for burial by further spin-coat deposition. Results are presented for typical core shapes, surface profiles after planarization, and optical insertion losses.Keywords
This publication has 2 references indexed in Scilit:
- Fabrication of buried channel waveguides on silicon substrates using spin-on glassApplied Optics, 1993
- Silica waveguides on silicon and their application to integrated-optic componentsOptical and Quantum Electronics, 1990