Radio-frequency (RF) plasma etching of graphite with oxygen: a scanning tunnelling microscope study
- 1 March 1993
- journal article
- Published by Elsevier in Surface Science
- Vol. 284 (3), 263-272
- https://doi.org/10.1016/0039-6028(93)90497-8
Abstract
No abstract availableKeywords
This publication has 32 references indexed in Scilit:
- Surface reactivity of oxygen on cleaved and sputtered graphiteSurface Science, 1992
- Laser microfabrication and activation of graphite and glassy carbon electrodesAnalytical Chemistry, 1990
- In situ scanning tunneling microscopy of the anodic oxidation of highly oriented pyrolytic graphite surfacesThe Journal of Physical Chemistry, 1988
- Effects of sputtering on the surface of graphiteJournal of Microscopy, 1988
- Oxidative mechanism of ascorbic acid at glassy carbon electrodesAnalytical Chemistry, 1986
- The influence of oxidative pretreatment of graphite electrodes on the catalysis of the Cr3+Cr2+ and Fe3+Fe2+ redox reactionsCarbon, 1985
- In situ cleaning and activation of solid electrode surfaces by pulsed laser lightAnalytical Chemistry, 1984
- Scanning electron microscopy of the surface morphology of graphitic electrode materials chemically modified by radiofrequency plasma and electrochemical treatmentsThe Analyst, 1982
- Introduction of functional groups onto carbon electrodes via treatment with radio-frequency plasmasAnalytical Chemistry, 1979
- Radiofrequency oxygen plasma treatment of pyrolytic graphite electrode surfacesAnalytical Chemistry, 1977