ELECTRICAL RESISTIVITY CHANGES IN THIN METALLIC FILMS DUE TO ION IRRADIATION

Abstract

The change in electrical resistance of thin Ag, Au, Ti, and W films was studied following energetic A⁺ ion bombardment. There is an initial reduction in film resistance (for all materials) during bombardment, which is attributed to removal of surface contaminant gas. The resistance then increases to a quasiequilibrium value, which is believed to be due to introduction of radiation damage to the films, and finally the resistance increases rapidly as the films sputter and thin.