Aerosol-gel deposition and low temperature heat-treatment of SiO2 layers
- 1 June 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 347 (1-2), 184-194
- https://doi.org/10.1016/s0040-6090(98)01755-6
Abstract
No abstract availableKeywords
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