Multi-ion-beam reactive co-sputtering (MIBRECS) system and technique for preparing complex oxide thin films

Abstract

Co-deposition techniques which allow to control independently the deposition rates of different components during film growth are promising methods for fabricating complex oxide thin films with good quality and ideal stoichiometry. The present work describes a novel multi-ion-beam reactive co-sputtering (MIBRECS) system and related technique, which allows fine control of film stoichiometry and structure. Initial results in preparing lanthanium modified lead titanate (PLT) ferroelectric thin films by using the system are given in a companion paper.