Pattern formation in amorphous WNx by low temperature electron cyclotron resonance etching for fabrication of x-ray mask
- 1 November 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 11 (6), 2943-2946
- https://doi.org/10.1116/1.586565