Differences between microwave and RF activation of nitrogen for the PECVD process

Abstract

The activation of nitrogen for the silicon nitride PECVD process outside the plasma region has been studied in both microwave and RF plasmas. A lower production of longlived metastable nitrogen particles necessary for the reactions with silane molecules has been observed in the RF plasma compared to the microwave plasma. The key role is ascribed to N(⁴S) atoms.