The role of native traps on the tunneling characteristics of ultra-thin (1.5–3 nm) oxides
- 1 September 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 48 (1-4), 31-34
- https://doi.org/10.1016/s0167-9317(99)00331-7
Abstract
No abstract availableKeywords
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