Writing nanometer-scale symbols in gold using the scanning tunneling microscope
- 10 April 1989
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 54 (15), 1424-1426
- https://doi.org/10.1063/1.100687
Abstract
The conditions required to electroetch nanometer-sized craters in flat gold substrates with a scanning tunneling microscope operating in air are identified. Reproducible nanometer-scale modifications of the substrate are possible. Letters and complex symbols with linewidths as small as 2 nm have been written. Experiments show that a good tunneling tip is not destroyed by the writing process.Keywords
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