The role of atmospheric oxygen and water in the generation of water marks on the silicon surface in cleaning processes
- 1 October 1989
- journal article
- Published by Elsevier in Materials Science and Engineering B
- Vol. 4 (1-4), 401-405
- https://doi.org/10.1016/0921-5107(89)90278-x
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Effects of Wet Cleaning on Si Contaminated with Heavy Metals during Reactive Ion EtchingJournal of the Electrochemical Society, 1985
- Silicon Cleaning with Hydrogen Peroxide Solutions: A High Energy Electron Diffraction and Auger Electron Spectroscopy StudyJournal of the Electrochemical Society, 1972