Effect of the Si wafer pretreatment on the patterned substrate morphology and growth of Hg1−xCdxTe PLD films
- 14 February 2000
- journal article
- Published by Elsevier in Materials Science and Engineering B
- Vol. 71 (1-3), 288-291
- https://doi.org/10.1016/s0921-5107(99)00392-x
Abstract
No abstract availableKeywords
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