Thermal reactions between aluminum and palladium layered films
- 1 April 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 67 (1), 35-44
- https://doi.org/10.1016/0040-6090(80)90284-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Study of Al/Pd2Si contacts on SiJournal of Vacuum Science and Technology, 1977
- Contact metallurgy for shallow junction Si devicesJournal of Applied Physics, 1976
- Deconvolution method for composition profiling by Auger sputtering techniqueSurface Science, 1976
- Kinetics of compound formation in thin film couples of Al and transition metalsJournal of Vacuum Science and Technology, 1976
- Structure of Thin Layers of Some F. C. C. Metals Deposited on Oriented Ag, Pd and Ni FilmsJournal of the Physics Society Japan, 1961