Analysis of resistance behavior in Ti- and Ni-salicided polysilicon films
- 1 January 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 41 (12), 2305-2317
- https://doi.org/10.1109/16.337443
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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