Internal Stress and Thermal Expansion Coefficient of GDa-Si Films
- 1 January 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (1)
- https://doi.org/10.1143/jjap.20.289
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Stress and Thermal-Expansion Coefficient of Chemical-Vapor-Deposited Glass FilmsJournal of Applied Physics, 1970
- Stresses in SiO[sub 2] Films Obtained from the Thermal Decomposition of Tetraethylorthosilicate—Effect of Heat-Treatment and HumidityJournal of the Electrochemical Society, 1969
- Measurement of the Elastic Constants of Silicon Single Crystals and Their Thermal CoefficientsPhysical Review B, 1951