High-energy x-ray microscopy with multilayer reflectors (invited)

Abstract

A knowledge of the spatial distribution of the x rays emitted by the hot plasma region is a key element in the study of the physical processes occurring in laser-produced plasmas and complements other diagnostics such as spectroscopy and temporal studies. X-ray microscopy with reflection microscopes offers the most direct means of obtaining this information. Until recently, the two types of microscopes that had been developed for this purpose, the Kirkpatrick–Baez and the Wolter, operated at relatively low energies (about 4–5 keV) and had very little spectral selectivity, relying on filters for coarse spectral resolution. With the development of x-ray reflecting multilayer mirrors, the energy response of such microscopes can be extended to 10 keV or higher, with good spectral selectivity. In addition, it is possible to reduce some of the optical aberrations to obtain improved spatial resolution. This paper describes some of the recent progress in making and evaluating x-ray reflectors, and outlines the optical design considerations for multilayer-coated microscopes. Results from a prototype multilayer K–B microscope are presented.