Determination of moments of experimental range distributions of boron implanted in silicon
- 1 January 1975
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 25 (3), 205-206
- https://doi.org/10.1080/00337577508235392
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Concentration profiles of boron implantations in amorphous and polycrystalline siliconRadiation Effects, 1975
- A note on the large-depth decrease of range and damage profilesRadiation Effects, 1972