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Optical monitoring for rate and uniformity control of low power plasma-enhanced CVD
Home
Publications
Optical monitoring for rate and uniformity control of low power plasma-enhanced CVD
Optical monitoring for rate and uniformity control of low power plasma-enhanced CVD
WD
W. C. Dautremont-Smith
W. C. Dautremont-Smith
JL
J. Lopata
J. Lopata
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1 October 1983
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 1
(4)
,
943-946
https://doi.org/10.1116/1.582716
Abstract
No abstract available
Cited by 5 articles