Fine-grained polysilicon films with built-in tensile strain
- 1 June 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 35 (6), 800-801
- https://doi.org/10.1109/16.2534
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Polycrystalline silicon-based sensorsSensors and Actuators, 1986
- A simple technique for the determination of mechanical strain in thin films with applications to polysiliconJournal of Applied Physics, 1985
- Planar processed polysilicon sealed cavities for pressure transducer arraysPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1984
- Polycrystalline Silicon Micromechanical BeamsJournal of the Electrochemical Society, 1983