Effect of Deposition Rate and Substrate Temperature on the Vacuum Ultraviolet Reflectance of MgF_2- and LiF-Overcoated Aluminum Mirrors
- 1 October 1972
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 11 (10), 2245-2248
- https://doi.org/10.1364/ao.11.002245
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.This publication has 10 references indexed in Scilit:
- A direct comparison of the visible and ultraviolet reflectance of aluminum films evaporated in conventional and ultra-high vacuum systemsOptics Communications, 1971
- Optical and Partial Pressure Analysis during Deposition of MgF 2 Films in Ultra High VacuumOptica Acta: International Journal of Optics, 1970
- Further Studies on LiF-Overcoated Aluminum Mirrors with Highest Reflectance in the Vacuum UltravioletApplied Optics, 1968
- Further Studies on MgF_2-Overcoated Aluminum Mirrors with Highest Reflectance in the Vacuum UltravioletApplied Optics, 1966
- Influence of Crystal Surface on the Optical Transmission of Lithium Fluoride in the Vacuum-Ultraviolet SpectrumJournal of the Optical Society of America, 1963
- Extreme Ultraviolet Reflectance of LiF-Coated Aluminum MirrorsJournal of the Optical Society of America, 1961
- Apparatus for the Measurement of Vacuum Ultraviolet Optical Properties of Freshly Evaporated Films before Exposure to AirJournal of the Optical Society of America, 1961
- Optical Constants and Reflectance and Transmittance of Evaporated Aluminum in the Visible and Ultraviolet*Journal of the Optical Society of America, 1961
- Reflecting Coatings for the Extreme Ultraviolet*Journal of the Optical Society of America, 1959