Soft x-ray lithography using radiation from laser-produced plasmas
- 1 July 1985
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 24 (13), 2024-2027
- https://doi.org/10.1364/ao.24.002024
Abstract
Plasmas formed by focusing 0.6-J pulses from a 10-Hz Nd:YAG laser onto solid targets were used as soft x-ray sources for lithographic studies. Results of exposing masked photoresists to plasma radiation produced using steel, copper, and tungsten as targets are presented.This publication has 3 references indexed in Scilit:
- Repetitively pulsed-plasma soft x-ray sourceApplied Optics, 1984
- Spectral-irradiance calibration of continuum emitted from rare-earth plasmasOptics Letters, 1982
- Rare-earth plasma light source for VUV applicationsApplied Optics, 1981