Metal-insulator phase transition in VO2: Influence of film thickness and substrate
- 1 June 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 150 (1), 11-14
- https://doi.org/10.1016/0040-6090(87)90304-x
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Epitaxial films of iron oxides grown by the method of chemical transport reactionThin Solid Films, 1984
- Stress induced switching in VO2 thin filmsPhysica Status Solidi (a), 1976
- Phase transition in reactively co-sputtered films of VO2TiO2Thin Solid Films, 1974
- Growth of VO2 Single Crystals by Chemical Transport ReactionJapanese Journal of Applied Physics, 1969