Determination of the total amount of oxygen atoms in silicon oxide surface layers by the nuclear reactions16O(d, p1)17O* and16O(d, α)14N
- 16 March 1973
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 16 (1), 211-217
- https://doi.org/10.1002/pssa.2210160122
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Stopping Cross Sections for 0.3- to 1.7-MeV Helium Ions in Silicon and Silicon DioxideJournal of Applied Physics, 1971
- Evolution de la teneur en oxygene lors de son dosage en surface par reaction nucleaireNuclear Instruments and Methods, 1971
- Microanalysis by the direct observation of nuclear reactions using a 2 MeV Van de GraaffNuclear Instruments and Methods, 1971
- Microanalysis of the stable isotopes of oxygen by means of nuclear reactionsAnalytical Chemistry, 1967
- Microanalysis of flourine in zircaloy by the use of the 19F(p, αγ)16O reactionNuclear Instruments and Methods, 1967
- Oxygen diffusion in quartz studied by proton bombardmentNuclear Instruments and Methods, 1965
- The mechanism of anodic oxidationJournal of Physics and Chemistry of Solids, 1962