Growth of Nickel Silicides on Silicon by Short Duration Incoherent Light Exposure
- 1 January 1983
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Epitaxial silicidesThin Solid Films, 1982
- Metallization technology for very-large-scale integration circuitsThin Solid Films, 1982
- Annealing of phosphorus implanted silicon by incoherent light scanningRadiation Effects, 1982
- Defect Control During Epitaxial Regrowth by Rapid Thermal AnnealingMRS Proceedings, 1982