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Mass spectrometric studies of plasma etching of silicon nitride
Home
Publications
Mass spectrometric studies of plasma etching of silicon nitride
Mass spectrometric studies of plasma etching of silicon nitride
PC
P. E. Clarke
P. E. Clarke
DF
D. Field
D. Field
AH
A. J. Hydes
A. J. Hydes
DK
D. F. Klemperer
D. F. Klemperer
MS
M. J. Seakins
M. J. Seakins
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1 November 1985
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 3
(6)
,
1614-1619
https://doi.org/10.1116/1.582949
Abstract
No abstract available
Cited by 29 articles