Fabrication of 45° mirrors together with well-defined v-grooves using wet anisotropic etching of silicon
- 1 January 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Journal of Microelectromechanical Systems
- Vol. 4 (4), 213-219
- https://doi.org/10.1109/84.475548
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Mesa structure formation using potassium hydroxide and ethylene diamine based etchantsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Laser machining of silicon for fabrication of new microstructuresPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- A micromachined pressure sensor with fiber-optic interferometric readoutSensors and Actuators A: Physical, 1994
- New shapes in (100) Si using KOH and EDP etchesJournal of Micromechanics and Microengineering, 1992
- Micromachining processes and structures in micro-optics and optoelectronicsJournal of Micromechanics and Microengineering, 1991
- Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation LayersJournal of the Electrochemical Society, 1990
- Optical components-the new challenge in packagingIEEE Transactions on Components, Hybrids, and Manufacturing Technology, 1990
- Self-aligned flat-pack fibre-photodiode couplingElectronics Letters, 1988
- GaAs laser array source packageOptics Letters, 1977