Binary phase digital reflection holograms: fabrication and potential applications
- 1 February 1977
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 16 (2), 413-417
- https://doi.org/10.1364/ao.16.000413
Abstract
A novel technique for the fabrication of binary-phase computer-generated reflection holograms is described. By use of integrated circuit technology, the holographic pattern is etched into a silicon wafer and then aluminum coated to make a reflection hologram. Because these holograms reflect virtually all the incident radiation, they may find application in machining with high-power lasers. A number of possible modifications of the hologram fabrication procedure are discussed.This publication has 16 references indexed in Scilit:
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