Lattice images of defect-free silicon on sapphire prepared by ion implantation

Abstract
We report for the first time high resolution cross section transmission electron microscopy (HRXTEM) of defect-free silicon on sapphire (SOS) films. These films are prepared from as-grown SOS films by use of multiple ion implantation and annealing sequences. HRXTEM lattice images for both as-grown and processed films are obtained, and correlation with previous ion channeling experiments on this material is discussed.