Effect of annealing cold-drawn polystyrene and polymethylmethacrylate below Tg

Abstract

Annealing of both cold-drawn atactic polystyrene and cold-drawn poly-methylmethacrylate at temperatures ranging from 50°C to their respective T_g's and for times ranging from 1 to 6 days gradually but completely eliminates the orientation arcing from the wide-angle X-ray diffraction pattern but induces only ∼25% recovery of the cold-drawn deformation (as calculated from dimensional shrinkage). Analogous studies show that the birefringence of cold-drawn polystyrene is reduced by 57% during the annealing treatment. The results are evidence for segmental molecular motion below T_g and suggest that the molecular alignment responsible for the wide-angle X-ray diffraction arcing is not necessarily the same molecular orientation required for dimensional recovery. We have tentatively interpreted these results in terms of our recently proposed structural model consisting of both ordered domains and connecting disordered regions in the amorphous polymeric solid state. Annealing below T_g can produce chain backbone motion within the disordered regions and cause disorientation of the aligned ordered domains brought about by the initial cold-draw process.