A new low-power microwave plasma source using microstrip technology for atomic emission spectrometry

Abstract

A new low-power, compact microwave-induced plasma source for applications in atomic emission spectrometry at atmospheric pressure using microstrip technology is described. The gas channel of about 1 mm² is integrated in a fused silica dielectric wafer. The microstrip transmission lines are fabricated by sputtering and electro-plating. For example, a unit operates at an input power of 15 W with an argon gas flow of about 500 ml min^-1 at atmospheric pressure. Rotational (OH) and excitation (Fe) temperatures of 650 K and 8000 K, respectively, were measured at these conditions. The emitted radiation can be taken up by an optical fibre positioned in the plasma-gas channel thus enabling an axial observation and coupling to a miniaturized spectrometer. The first devices showed an operation time of at least several hundred hours. Further investigations will lead to even smaller dimensions and lower power consumption and open the way for integrated microwave plasma sources with low detection limits as integrable parts of miniaturized total analytical systems applications.