Modeling of in-plane distortions due to variations in absorber stress
- 31 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4), 227-230
- https://doi.org/10.1016/0167-9317(95)00233-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Effect of brightener concentration on the thermal distortion of gold plated x-ray masksJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Practical considerations in x-ray mask mounting methodologyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993