Infrared absorption of silicon isotopes in gallium phosphide
- 1 December 1974
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 45 (12), 5475-5477
- https://doi.org/10.1063/1.1663266
Abstract
Infrared absorption measurements at ∼80°K on 28Si‐ and (28Si+30Si)‐doped GaP grown by liquid‐phase epitaxy and compensated by electron irradiation are presented. Several new bands are observed with samples containing the mixed isotopes. The observed frequencies of 28Si‐related bands agree with previously reported values, and the isotopic shifts for 30Si‐related bands agree with values calculated from local mode theory. The results indicate that one band is attributable to a defect containing two Si atoms on nonequivalent sites, presumably nearest‐neighbor substitutional pairs. The present measurements confirm the previous observations of a much larger concentration of pairs than that predicted by random statistics.Keywords
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