Abstract
The nature of a high-temperature plasma layer adjacent to a vaporizing conductor surface in multimegagauss flux compression systems is of interest in terms of the maximum field levels attainable and the extent to which high-Z conductor impurities will contaminate plasmas confined by ultrahigh magnetic fields. A model has been developed for such a conductor plasma layer, based on the assumption of a steady balance between resistive heating and radiation loss at any location within the plasma layer. A general analytical solution is found for the magnetic field distribution through the layer in terms of plasma and conductor properties and a nondimensionalized profile integral. Criteria are derived emphasizing the need for proper dynamic operation if plasma conduction layers are to have any importance in high-field flux compression systems.

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