Application of Hot Wire Deposited Intrinsic Poly-Silicon Films in N-I-P cells and TFTS
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
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This publication has 2 references indexed in Scilit:
- Two-step annealed polycrystalline silicon thin-film transistorsJournal of Applied Physics, 1996
- Production of high-quality amorphous silicon films by evaporative silane surface decompositionJournal of Applied Physics, 1988