Discharge comparison of nonequilibrium atmospheric pressure Ar/O2 and He/O2 plasma jets
- 20 October 2003
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 83 (16), 3272-3274
- https://doi.org/10.1063/1.1615674
Abstract
A plasma jet has been developed that operates using rf power and produces a stable homogeneous discharge at atmospheric pressure.Dischargecharacteristics for the gas mixture of He/O 2 and Ar/O 2 were studied. The temperature distribution at the exit of the nozzle of Ar/O 2 discharge is about 100 K higher than that for the He/O 2 discharge—identified by an increased temperature—extends much farther downstream for Ar/O 2 discharge in contrast to the He/O 2 discharge—250 mm as compared to 75 mm. Optical emission spectra for both discharges in the jet effluent shows only fractions of the peak intensities of Ar, He, and O atomic lines compared with spectra taken looking obliquely inside the jet volume. The spatial profile of excited atomic oxygen at λ=777 nm ( 4 S 0 3p–3s) taken side on to the flow direction outside the nozzle shows good correlation to the temperature distribution for both discharges. These results indicate that the Ar/O 2 discharge has better energy transfer efficiency than the He/O 2 discharge. Study of the electrical properties of the two discharges shows that the two discharges exhibit a different capacitive nature and the voltage wave form for He/O 2 advances that of the Ar/O 2 discharge by 16°, which means there is more ohmic component in the Ar/O 2 discharge.Keywords
This publication has 13 references indexed in Scilit:
- Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressurePlasma Sources Science and Technology, 2002
- Deposition of silicon dioxide films with a non-equilibrium atmospheric-pressure plasma jetPlasma Sources Science and Technology, 2001
- Tantalum etching with a nonthermal atmospheric-pressure plasmaJournal of Vacuum Science & Technology A, 2000
- Reaction Chemistry in the Afterglow of an Oxygen−Helium, Atmospheric-Pressure PlasmaThe Journal of Physical Chemistry A, 2000
- An atmospheric pressure plasma sourceApplied Physics Letters, 2000
- Decontamination of chemical and biological warfare (CBW) agents using an atmospheric pressure plasma jet (APPJ)Physics of Plasmas, 1999
- Etching materials with an atmospheric-pressure plasma jetPlasma Sources Science and Technology, 1998
- Multitube surface-wave discharges for increased gas throughput at atmospheric pressureJournal of Applied Physics, 1998
- Experimental and theoretical study of a glow discharge at atmospheric pressure controlled by dielectric barrierJournal of Applied Physics, 1998
- UV excimer radiation from dielectric-barrier dischargesApplied Physics B Laser and Optics, 1988