Effect of analytical method on thickness measurements of thin oxide films
- 1 May 1988
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 11 (8), 441-446
- https://doi.org/10.1002/sia.740110806
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- The composition and morphology of oxide films formed on type 304 stainless steel in lithiated high temperature waterCorrosion Science, 1986
- Surface studies of austenitic alloys subjected to crevice corrosion in sea waterCorrosion Science, 1985
- Calibration of argon ion sputter rates using nuclear microanalysis and Auger spectroscopySurface and Interface Analysis, 1985
- The ultra-high resolution depth profiling reference material — Ta2O5 anodically grown on TaSurface Science, 1984
- Auger electron spectroscopy and X-ray photoelectron spectroscopy studies of the oxidation of polycrystalline tantalum and niobium at room temperature and low oxygen pressuresJournal of the Less Common Metals, 1983
- The depth dependence of the depth resolution in composition–depth profiling with Auger Electron SpectroscopySurface and Interface Analysis, 1983
- Abstract: Chemical structure of the transitional region of the SiO2–Si interfaceJournal of Vacuum Science and Technology, 1978
- A kinetic study of the initial oxidation of the Ni(001) surface by RHEED and x-ray emissionSurface Science, 1976
- Photoelectron spectroscopic study of the interaction of nickel and oxygenFaraday Discussions of the Chemical Society, 1975
- Composition of Pt Anode Surfaces by Auger SpectroscopyJournal of the Electrochemical Society, 1974