Glow Discharge Optical Spectroscopy for Monitoring Sputter Deposited Film Thickness

Abstract

Glow discharge optical spectroscopy was used as a technique for monitoring the rate of sputtering and the rate of film deposition. It was determined that within the pressure and voltage range of these experiments the product of the electroluminescent emission intensity of a given sputtered target species in the discharge and the time of sputtering is linearly proportional to both the change in mass of the target and the final thickness of the deposited film. In the case of compound targets, the emission intensity from either constituent can be monitored. The emission signal was shown to be generated primarily in a narrow region directly in front of the target.