Influence of the altered layer on depth profiling measurements
- 15 February 1976
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 28 (4), 176-179
- https://doi.org/10.1063/1.88714
Abstract
A simple phenomenological theory of alloy sputtering is developed which suggests that in some instances the depth resolution of depth profiling measurements is limited by the time it takes to create a layer of altered chemical composition at the surface.Keywords
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