Oxide nucleation on thin films of copper duringin Situ oxidation in an electron microscope
- 1 August 1975
- journal article
- Published by Springer Nature in Oxidation of Metals
- Vol. 9 (4), 379-400
- https://doi.org/10.1007/bf00613537
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Spatial distributions of H2 desorbed from Fe, Pt, Cu, Nb, and stainless steel surfacesSurface Science, 1973
- In Situ Sputter Cleaning of Thin Film Metal Substrates For UHV-TEM Corrosion StudiesJournal of Vacuum Science and Technology, 1973
- Selected-Zone Dark-Field Electron MicroscopyApplied Physics Letters, 1972
- The Initial Oxidation Rates of Single-Crystal Copper and the Effect of Gaseous PretreatmentJournal of the Electrochemical Society, 1971
- Preparation of Step-free Single Crystal Metal Films with Desired Surface Orientations by Means of Vacuum EvaporationJapanese Journal of Applied Physics, 1969
- THE REACTION OF OXYGEN WITH THIN CRYSTALS OF COPPERPublished by Elsevier ,1967
- Surface diffusion and the growth of oxide particles on metal surfacesTransactions of the Faraday Society, 1965
- Surface migration of oxygen and metal atoms during the oxidation of copper and silverSurface Science, 1964
- The structure of oxide films on different faces of a single crystal of copperActa Metallurgica, 1956
- Diskontinuierliche Anlaufschichten auf KupferThe Science of Nature, 1954