Abstract
An expression is developed for theI-Vcharacteristics of a depletion-mode device in the subpinchoff region. This expression is found to correlate well with experimental results taken on n-channel polysilicon gate devices, predicting a region of exponential current rise with gate voltage. It is of interest to note that the subpinchoffI-Vcharacteristics of a depletion-mode device form a dual to those of an enhancement-mode device.