The Use of 1.1.1.‐Trichloroethane as an Optimized Additive to Improve the Silicon Thermal Oxidation Technology
- 1 October 1978
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 125 (10), 1696-1703
- https://doi.org/10.1149/1.2131275